Pfeiffer pumping station now available with backing pump

The multi-stage ACP roots pump is the dry alternative to the conventional rotary vane pump. As the ACP does not include gaskets between rotor and stator and the rotors run without contact, no gasket wear results in the pumping system as it does with other dry pumps. Therefore, this pump is suitable for all vacuum applications for which maximum cleanliness is required. In normal use, the maintenance intervals are up to four years apart.

The HiCube Pro pumping station is modular, allowing different combinations of backing and turbopumps to be tailored for every application. It is suitable for all high vacuum applications in research and development, particle accelerators and analysis and surface physics. In addition to the version with a dry, multi-stage ACP roots pump, it is also available with an oilsealed PentaLine rotary vane pump.