Computers & Chemical Engineering is primarily a journal of record for new developments in the application of computing and systems technology to chemical engineering problems. Several major areas of study are represented in the journal, including:

• Modeling, numerical analysis and simulation
• Mathematical programming (optimization)
• Cyberinfrastructure, informatics and intelligent systems
• Process and product synthesis/design
• Process dynamics, control and monitoring
• Abnormal events management and process safety
• Plant operations, integration, planning/scheduling and supply chain
• Enterprise-wide management and technology-driven policy making
• Domain applications (molecular, biological, pharmaceutical, food, energy, and environmental systems engineering)

Also, general papers on process systems engineering are welcome as well as emerging new areas and topics not covered above.

Articles published cover different aspects of the application of process systems engineering to one or more of the general areas listed above, including new applications of established methods, comparisons of alternative methodologies, descriptions of state-of-the-art industrial applications and significant developments in computing targeted at training/education. Reports of software implementation must feature novel uses of state-of-the-art computing technologies. Computers & Chemical Engineering publishes full-length articles, perspective papers, journal reviews, short notes and letters to the editor.

Online article submission now available via: http://ees.elsevier.com/cace

Comments and Proposals: We are interested in receiving comments/feedback on this and our other journals and welcome publication proposals for books, electronic products, new journals and co-operation for existing journals.

Editorial board

Editor-in-Chief

  • E.N. Pistikopoulos
    Texas A&M University, College Station, Texas, USA

Editors

  • J.H. Lee
    Korea Advanced Institute of Science and Technology (KAIST), Daejeon, The Republic of Korea
  • V. Venkatasubramanian
    Columbia University, New York, New York, USA

Associate Editors

  • Ana Póvoa
    Instituto Superior Técnico, Porto Salvo, Portugal
  • Fengqi You
    Cornell University, Ithaca, New York, USA

Editorial Advisory Board

  • C. Adjiman
    Imperial College London, London, UK
  • P. Bahri
    Murdoch University, Perth, Western Australia, Australia
  • R.D. Braatz
    Massachusetts Institute of Technology, Cambridge, Massachusetts, USA
  • M.F. Doherty
    University of California at Santa Barbara, Santa Barbara, California, USA
  • M.R. Eden
    Auburn University, Auburn, Alabama, USA
  • T.F. Edgar
    University of Texas, Austin, Texas, USA
  • S. Engell
    Technische Universität Dortmund, Dortmund, Germany
  • C.A. Floudas †
    Princeton University, Princeton, New Jersey, USA
  • R. Gani
    Danmarks Tekniske Universitet (DTU), Kgs. Lyngby, Denmark
  • I.E. Grossmann
    Carnegie Mellon University, Pittsburgh, Pennsylvania, USA
  • C. Han
    Seoul National University (SNU), Seoul, The Republic of Korea
  • S. Hasebe
    Kyoto University, Nishikyo-ku, Kyoto, Japan
  • M. Hirao
    University of Tokyo, Tokyo, Japan
  • A.N. Hrymak
    Western University, London, Ontario, Canada
  • M. Ierapetritou
    Rutgers University, Piscataway, New Jersey, USA
  • A. Jiménez Gutiérrez
    Instituto Tecnologico de Celaya, Celaya, Gto, Mexico
  • X. Joulia
    INP-ENSIACET, Toulouse, France
  • M. Kubícek
    Institute of Chemical Technology Prague, Prague, Czech Republic
  • A. Linninger
    University of Illinois at Chicago, Chicago, Illinois, USA
  • C.T. Maravelias
    University of Wisconsin at Madison, Madison, Wisconsin, USA
  • W. Marquardt
    RWTH Aachen University (RWTH), Aachen, Germany
  • A. Mitsos
    RWTH Aachen University, Aachen, Germany
  • M. Morari
    Eidgenössische Technische Hochschule (ETH) Zürich, Zürich, Switzerland
  • K.M Ng
    Hong Kong University of Science and Technology, Hong Kong, China
  • L.C. Puigjaner
    Universitat Politècnica de Catalunya (UPC), Barcelona, Spain
  • G.V. Reklaitis
    Purdue University, West Lafayette, Indiana, USA
  • W.D. Seider
    University of Pennsylvania, Philadelphia, Pennsylvania, USA
  • M. Shacham
    Ben Gurion University of the Negev, Beer Sheva, Israel
  • J. Siirola
    Sandia National Laboratories, Albuquerque, New Mexico, USA
  • S. Skogestad
    Norwegian University of Science & Technology NTNU, Trondheim, Norway
  • G. Stephanopoulos
    Massachusetts Institute of Technology, Cambridge, Massachusetts, USA
  • C.L.E. Swartz
    McMaster University, Hamilton, Ontario, Canada
  • J. Zhao
    Tsinghua University, Beijing, China