Computers & Chemical Engineering is primarily a journal of record for new developments in the application of computing and systems technology to chemical engineering problems. Several major areas of study are represented in the journal, including:

• Modeling, numerical analysis and simulation
• Mathematical programming (optimization)
• Cyberinfrastructure, informatics and intelligent systems
• Process and product synthesis/design
• Process dynamics, control and monitoring
• Abnormal events management and process safety
• Plant operations, integration, planning/scheduling and supply chain
• Enterprise-wide management and technology-driven policy making
• Domain applications (molecular, biological, pharmaceutical, food, energy, and environmental systems engineering)

Also, general papers on process systems engineering are welcome as well as emerging new areas and topics not covered above.

Articles published cover different aspects of the application of process systems engineering to one or more of the general areas listed above, including new applications of established methods, comparisons of alternative methodologies, descriptions of state-of-the-art industrial applications and significant developments in computing targeted at training/education. Reports of software implementation must feature novel uses of state-of-the-art computing technologies. Computers & Chemical Engineering publishes full-length articles, perspective papers, journal reviews, short notes and letters to the editor.

Online article submission now available via: http://ees.elsevier.com/cace

Comments and Proposals: We are interested in receiving comments/feedback on this and our other journals and welcome publication proposals for books, electronic products, new journals and co-operation for existing journals.

Editorial board

Editor-in-Chief

  • E.N. Pistikopoulos
    Texas A&M University College Station, College Station, Texas, United States

Editors

  • J. H. Lee
    Korea Advanced Institute of Science and Technology, Daejeon, Korea, Republic of
  • A.B.P. Póvoa
    Instituto Superior Técnico, Dept. de Engenharia e Gestão, Porto Salvo, Portugal
  • V. Venkatasubramanian
    Columbia University, New York, New York, United States
  • Fengqi You
    Cornell University, Ithaca, New York, United States

Associate Editor

  • Alexander Mitsos
    RWTH Aachen University, Aachen, Germany

Editorial Advisory Board

  • C. Adjiman
    Imperial College London Department of Chemical Engineering and Chemical Technology, London, United Kingdom
  • P. Bahri
    Murdoch University, School of Engineering and Information Technology, Perth, Western Australia, Australia
  • R.D. Braatz
    MASSACHUSETTS INSTITUTE OF TECHNOLOGY, Cambridge, Massachusetts, United States
  • X. Chen
    Zhejiang University, Hangzhou, China
  • M.R. Eden
    Auburn University, Auburn, Alabama, United States
  • T.F. Edgar
    University of Texas System, Austin, Texas, United States
  • S. Engell
    TU Dortmund University, Dortmund, Germany
  • R. Gani
    PSE for SPEED, Allerod, Denmark
  • I.E. Grossmann
    Carnegie Mellon University, Dept. of Chemical Engineering, Pittsburgh, Pennsylvania, United States
  • S. Hasebe
    Kyoto University, Kyoto, Japan
  • M. Hirao
    The University of Tokyo, Dept. of Chemical System Engineering, Tokyo, Japan
  • A.N. Hrymak
    Western University, London, Ontario, Canada
  • M. Ierapetritou
    Rutgers University, Department of Chemical and Biochemical Engineering, Piscataway, New Jersey, United States
  • A. Jiménez Gutiérrez
    Technological Institute of Celaya, Celaya, Mexico
  • X. Joulia
    Graduate National School of Chemical and Technological Engineering, Toulouse, France
  • M. Kubícek
    University of Chemistry and Technology Prague, Praha, Czech Republic
  • J.M. Lee PhD
    Seoul National University (SNU), School of Chemical & Biological Engineering, Seoul, Korea, Republic of
  • A. Linninger
    University of Illinois at Chicago, Chicago, Illinois, United States
  • P. Liu PhD
    Tsinghua University, Beijing, China
  • C.T. Maravelias
    University of Wisconsin Madison, Madison, Wisconsin, United States
  • R. Misener PhD
    Imperial College London, London, United Kingdom
  • M. Morari
    Swiss Federal Institute of Technology, Zurich, Switzerland
  • K.M Ng
    Department of Chemical and Biomolecular Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
  • L.C. Puigjaner
    Polytechnic University of Catalonia, Barcelona, Spain
  • G.V. Reklaitis
    Purdue University School of Chemical Engineering, Lafayette, Indiana, United States
  • W.D. Seider
    University of Pennsylvania Hillel, Philadelphia, Pennsylvania, United States
  • M. Shacham
    Ben-Gurion University of the Negev, Be'er Sheva, Israel
  • J. Siirola
    Sandia National Laboratories, Albuquerque, New Mexico, United States
  • S. Skogestad
    Norwegian University of Science and Technology, Trondheim, Norway
  • G. Stephanopoulos
    MASSACHUSETTS INSTITUTE OF TECHNOLOGY, Cambridge, Massachusetts, United States
  • C.L.E. Swartz
    McMaster University, Hamilton, Ontario, Canada
  • J. Zhao
    Tsinghua University, Beijing, China