Computers & Chemical Engineering is primarily a journal of record for new developments in the application of computing and systems technology to chemical engineering problems. Several major areas of study are represented in the journal, including:

• Modeling, numerical analysis and simulation
• Mathematical programming (optimization)
• Cyberinfrastructure, informatics and intelligent systems
• Process and product synthesis/design
• Process dynamics, control and monitoring
• Abnormal events management and process safety
• Plant operations, integration, planning/scheduling and supply chain
• Enterprise-wide management and technology-driven policy making
• Domain applications (molecular, biological, pharmaceutical, food, energy, and environmental systems engineering)

Also, general papers on process systems engineering are welcome as well as emerging new areas and topics not covered above.

Articles published cover different aspects of the application of process systems engineering to one or more of the general areas listed above, including new applications of established methods, comparisons of alternative methodologies, descriptions of state-of-the-art industrial applications and significant developments in computing targeted at training/education. Reports of software implementation must feature novel uses of state-of-the-art computing technologies. Computers & Chemical Engineering publishes full-length articles, perspective papers, journal reviews, short notes and letters to the editor.

Online article submission now available via:

Comments and Proposals: We are interested in receiving comments/feedback on this and our other journals and welcome publication proposals for books, electronic products, new journals and co-operation for existing journals.

Editorial board


  • Stratos Pistikopoulos PhD FIChemE FAIChE FREng
    Texas A&M University College Station, College Station, Texas, United States


  • Ana Barbosa-Povoa PhD
    Técnico Lisboa Department of Engineering and Management, Porto Salvo, Portugal
  • J. H. Lee
    Korea Advanced Institute of Science and Technology, Daejeon, Korea, Republic of
  • Fengqi You PhD
    Cornell University, Ithaca, New York, United States

Associate Editors

  • Ruth Misener
    Imperial College London, London, United Kingdom
  • Alexander Mitsos
    RWTH Aachen University, Aachen, Germany

Editorial Advisory Board

  • Claire Adjiman Professor
    Imperial College London, London, United Kingdom
  • P. Bahri
    Murdoch University School of Engineering and Information Technology, Murdoch, Australia
  • R.D. Braatz
    Massachusetts Institute of Technology, Cambridge, Massachusetts, United States
  • X. Chen
    Zhejiang University, Hangzhou, China
  • W. DU
    East China University of Science and Technology, Shanghai, China
  • Maria Soledad Diaz PhD
    Southern National University, Chemical Engineering, Buenos Aires, Argentina
  • M.R. Eden
    Auburn University, Auburn, Alabama, United States
  • T.F. Edgar
    The University of Texas System, Austin, Texas, United States
  • S. Engell
    TU Dortmund University, Dortmund, Germany
  • Rafiqul Gani PhD, DIC, MSc, BSc
    PSE for SPEED Co Ltd, Bangkok, Thailand
  • I.E. Grossmann
    Carnegie Mellon University Department of Chemical Engineering, Pittsburgh, Pennsylvania, United States
  • S. Hasebe
    Kyoto University, Kyoto, Japan
  • M. Hirao
    The University of Tokyo Graduate School of Engineering Faculty of Engineering Department of Chemical System Engineering, Bunkyo-Ku, Japan
  • M. Ierapetritou
    Rutgers University Department of Chemical and Biochemical Engineering, Piscataway, New Jersey, United States
  • A. Jiménez Gutiérrez
    Technological Institute of Celaya, Celaya, Mexico
  • X. Joulia
    Graduate National School of Chemical and Technological Engineering, Toulouse, France
  • Jong Min Lee PhD
    Seoul National University, Seoul, Korea, Republic of
  • P. Liu PhD
    Tsinghua University, Beijing, China
  • C.T. Maravelias
    Princeton University, Princeton, New Jersey, United States
  • M. Morari
    Swiss Federal Institute of Technology, Zurich, Switzerland
  • K.M Ng
    Department of Chemical and Biomolecular Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Hong Kong
  • Luis Puigjaner PhD
    Polytechnic University of Catalonia, Barcelona, Spain
  • Gintaras Reklaitis PhD
    Purdue University School of Chemical Engineering, Lafayette, Indiana, United States
  • Warren D. Seider Professor
    University of Pennsylvania Hillel, Philadelphia, Pennsylvania, United States
  • Mordechai Shacham DSc
    Ben-Gurion University of the Negev, Be'er Sheva, Israel
  • Jeffrey Siirola PhD
    Purdue University, West Lafayette, Indiana, United States
  • S. Skogestad
    Norwegian University of Science and Technology, Trondheim, Norway
  • C.L.E. Swartz
    McMaster University, Hamilton, Ontario, Canada
  • V. Venkatasubramanian
    Columbia University, New York, New York, United States
  • J. Zhao
    Tsinghua University, Beijing, China