The APS is wafer-like technology that moves through semiconductor process equipment and automation material handing systems to monitor airborne particles, reporting back information in real-time to allow engineers to validate and analyze wafer contamination. It can reduce the time and expense associated with process equipment particle qualification.

With real-time views of particle conditions, process engineers can address specific trouble spots and be better prepared to pass particle qualifications on the very first attempt.
CyberOptics’s APS uses a fan to pull non-corrosive gas or air through a channel as a laser illuminates the gas stream while particles scatter light onto the sensors photodiode. It has the ability to detect 0.1 um particles in multiple Bin schemes. The sensor can detect particles in real-time without opening the tool.